An Elastic Potential based Soft-EHL Model for Slurry Fluid Pressure Prediction during CMP

摘要

A soft elasto-hydrodynamic lubrication (EHL) model isdeveloped which captures both sub-ambient and superambientinterfacial fluid pressure as reported in past CMPexperiments. Discrete elastic potential contact mechanicmodels are coupled with the Greenwood-WilliamsonHertzian contact model and the Reynolds’ equation, inorder to predict fluid pressure during fixed-wafer CMP.Modeling results are compared to experimental data.