Characterization of multilayer stack parameters from X-ray reflectivity data using the PPM program: measurements and comparison with TEM results

摘要

Future hard (10 -100 keV) X-ray telescopes (SIMBOL-X, Con-X, HEXIT-SAT, XEUS) will implement focusing optics with multilayer coatings: in view of the production of these optics we are exploring several deposition techniques for the reflective coatings. In order to evaluate the achievable optical performance X-Ray Reflectivity (XRR) measurements are performed, which are powerful tools for the in-depth characterization of multilayer properties (roughness, thickness and density distribution). An exact extraction of the stack parameters is however difficult because the XRR scans depend on them in a complex way. The PPM code, developed at ERSF in the past years, is able to derive the layer-by-layer properties of multilayer structures from semi-automatic XRR scan fittings by means of a global minimization procedure in the parameters space. In this work we will present the PPM modeling of some multilayer stacks (Pt/C and Ni/C) deposited by simple e-beam evaporation. Moreover, in order to verify the predictions of PPM, the obtained results are compared with TEM profiles taken on the same set of samples. As we will show, PPM results are in good agreement with the TEM findings. In addition, we show that the accurate fitting returns a physically correct evaluation of the variation of layers thickness through the stack, whereas the thickness trend derived from TEM profiles can be altered by the superposition of roughness profiles in the sample image.