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DEFECT DISORDER AND SEMICONDUCTING PROPERTES OF TITANIUM DIOXIDE SINGLE CRYSTAL

机译:二氧化钛单晶的缺陷紊乱和半导电性能

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The semiconducting properties of TiO_2 single crystal and their changes during oxidation and reduction at elevated temperatures (1073 - 1323 K) under controlled oxygen activity (10~(-9) — 10~5 Pa) were monitored using measurements of electrical conductivity and thermoelectric power. The experimental data obtained in equilibrium led to a TiO_2 defect disorder model. According to this model, oxygen vacancies are the predominant defect species in TiO_2 across a wide range of oxygen activities. This work has discovered the diffusion of Ti vacancies, which are formed during prolonged oxidation at elevated temperatures and in a gas phase of high oxygen activity. Observations indicate that appreciable concentrations of Ti vacancies are formed on the TiO_2 surface and then are very slowly incorporated into the bulk. The obtained diffusion data has shown that in the commonly studied temperature range (1000-1400 K) the Ti vacancy concentration is quenched and can be considered as constant. Prolonged oxidation involves two kinetic regimes that are related to the transport of defects of different mobilities. The defect disorder model derived in this work may be beneficial for engineering TiO_2 for enhanced water splitting through the selection of optimal processing conditions, including temperature and oxygen activity.
机译:通过测量电导率和热电势,监测了在受控氧活度(10〜(-9)— 10〜5 Pa)下高温(1073-1323 K)下TiO_2单晶的半导体性质及其在氧化和还原过程中的变化。 。在平衡状态下获得的实验数据导致了TiO_2缺陷无序模型。根据该模型,在广泛的氧气活动中,氧空位是TiO_2中的主要缺陷种。这项工作发现了Ti空位的扩散,这是在高温和高氧活度的气相中长时间氧化过程中形成的。观察结果表明,在TiO_2表面上形成了可观浓度的Ti空位,然后非常缓慢地掺入到本体中。所获得的扩散数据表明,在通常研究的温度范围(1000-1400 K)中,Ti空位浓度被淬灭,可以认为是恒定的。长时间的氧化涉及与不同迁移率缺陷的运输有关的两个动力学机制。通过选择最佳处理条件(包括温度和氧气活度),通过这项工作得出的缺陷失调模型对于工程TiO_2增强水分解可能是有益的。

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