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Three Dimensional Model for Anomalous Target Erosion in Magnetron Sputtering

机译:磁控溅射靶侵蚀的三维模型

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摘要

A parallelized three dimensional simulation environment for low pressure/low temperature plasma discharges has been implemented at Fraunhofer IST. Based on this tool, plasma discharges of rectangular planar magnetrons were simulated, focusing on the cause for anomalous target erosion known as cross-corner effect.The simulation results pointed out a strong correlation between the electron density distribution and the perpendicular magnetic field geometry across the target surface i.e. The magnetic confinement. According to this correlation an explanation model for the cross-corner effect has been developed which is related to the electron drift current and the spatial geometry of the magnetic confinement.It was assumed that the cross-corner effect is related to an angular deviation of the magnetic confinement at the end section of conventional sputter magnetrons. According to this assumption the layout of a conventional sputter magnetron was adjusted to counteract the angular deviation. Based on our simulations, it could be shown, that these adjustments significantly reduce the cross-corner effect.
机译:Fraunhofer IST实施了用于低压/低温等离子体放电的并行三维仿真环境。在此工具的基础上,对矩形平面磁控管的等离子体放电进行了模拟,重点研究了靶腐蚀异常的原因,即交叉角效应(cross-corner effect),模拟结果指出了整个平面上电子密度分布与垂直磁场几何形状之间存在很强的相关性。目标表面,即磁约束。根据这种相关性,建立了交叉角效应的解释模型,该模型与电子漂移电流和磁约束的空间几何形状有关。假设交叉角效应与电子的漂移角有关。常规溅射磁控管末端的磁性限制。根据该假设,调整常规溅射磁控管的布局以抵消角度偏差。根据我们的仿真,可以看出,这些调整大大降低了交叉角的影响。

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