GaN Diffractive microlens fabricated with gray-level mask

摘要

We present the design and the fabrication of the GaN diffractive mcirolens by gray-level mask and inductively coupled plasma etching. The microlens was designed for the application of high-density optical data storage. The calculation results show that the high-numerical-aperture GaN diffractive microlens could be achieved by using the gray-level mask. The fabrication of the GaN diffractive microlens has been demonstrated for the first time. The advantage of using GaN as the material of the diffractive microlens is discussed.