首页> 外文会议>Sixth International Symposium on Diamond Materials, 6th, Oct 17-22, 1999, Honolulu, Hawaii >ANALYSIS OF ORGANIC PLATING ADDITIVES USING BORON-DOPED DIAMOND ELECTRODES
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ANALYSIS OF ORGANIC PLATING ADDITIVES USING BORON-DOPED DIAMOND ELECTRODES

机译:掺硼金刚石电极对有机电镀添加剂的分析

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Boron-doped, diamond film electrodes were investigated as sensor electrodes for typical organic copper-plating additives. On diamond, oxidative peaks for dilute (ppm range) poly(alkylene glycol) (E_p=+2.05, +2.4V) and disodium (bis(3-sulfopropyl)) disulfide (E_p=+1.65, +2.1V) in excess CuSO_4/H_2SO_4 were observed. The peaks increased linearly with additive concentration. In contrast, on platinum, no peaks for glycol or disulfide oxidation or reduction could be observed. On diamond, CuSO_4/H_2SO_4 solutions of 4000 molecular weight poly(ethylene glycol) displayed higher peak currents than 10,000 molecular weight. Disulfide in H_2SO_4 displayed different oxidation peak potentials and heights than in CuSO_4/H_2SO_4 mixtures. In CuSO_4/H_2SO_4/HCl, the oxidative charge (E_p=+2.1, +2.3 V) and peak current (E_p=+2.1V) for glycol, disulfide, and 2-imidazolidinethione mixtures varied linearly, when varying one additive concentration and holding the others constant. The majority of charge transfer was from glycol oxidation, which was present in greater concentration. Selective glycol dilution should improve sensitivity for concentration changes of the less concentrated additives. Consequently, diamond electrodes are highly promising as sensor electrodes for plating bath additives.
机译:研究了掺硼金刚石薄膜电极作为典型有机镀铜添加剂的传感器电极。在钻石上,过量CuSO_4的稀(ppm范围)聚亚烷基二醇(E_p = + 2.05,+ 2.4V)和二硫化二钠(双(3-磺基丙基))的氧化峰(E_p = + 1.65,+ 2.1V)观察到/ H_2SO_4。峰随添加剂浓度线性增加。相反,在铂上,未观察到乙二醇或二硫化物氧化或还原的峰。在钻石上,分子量为4,000的聚乙二醇的CuSO_4 / H_2SO_4溶液显示出比10,000分子量更高的峰值电流。与CuSO_4 / H_2SO_4混合物相比,H_2SO_4中的二硫化物显示出不同的氧化峰电位和高度。在CuSO_4 / H_2SO_4 / HCl中,改变一种添加剂的浓度并保持不变时,乙二醇,二硫键和2-咪唑烷硫酮混合物的氧化电荷(E_p = + 2.1,+2.3 V)和峰值电流(E_p = + 2.1V)线性变化其他不变。大部分电荷转移来自乙二醇氧化,其浓度更高。选择性乙二醇稀释应提高对浓度较低的添加剂浓度变化的敏感性。因此,金刚石电极作为电镀浴添加剂的传感器电极非常有前途。

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