首页> 外文会议>Sixth International Symposium on Diamond Materials, 6th, Oct 17-22, 1999, Honolulu, Hawaii >HYDROGEN DOPED THIN FILM DIAMOND PHOTOTRANSISTOR/PHOTODIODE STRUCTURES FOR THE DETECTION OF UV RADIATION
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HYDROGEN DOPED THIN FILM DIAMOND PHOTOTRANSISTOR/PHOTODIODE STRUCTURES FOR THE DETECTION OF UV RADIATION

机译:氢掺杂的薄膜金刚石光敏晶体管/光电二极管结构,用于检测紫外线辐射

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The success of active electronic devices fabricated on CVD diamond has been hindered by the lack of shallow n or p-type dopants. However, UV photoconductors utilising the intrinsic form of the material have shown promising visible blind operational characteristics and there is clearly a market for simple robust devices of this nature. The recent emergence of near surface hydrogen doped CVD material, which exhibits useful room temperature electrical properties (p-type, high carrier concentration, low activation energy), has enabled the fabrication of diode and transistor structures with promising electrical characteristics. This paper reports the fabrication of two active optical detectors which utilise these structures; a metal-semiconductor-metal Schottky barrier device (MSM) and an optically controlled field effect transistor (OPFET). The performance of the two device structures is compared and their potential for use in deep UV visible blind detection is discussed. Device performance is strongly influenced by the contact properties of the ohmic and Schottky junctions which make up these structures. The circular transmission line method (c-TLM) has been used to examine, for the first time, the properties of different ohmic metallisations made to hydrogenated polycrystalline CVD diamond and the implications for improved device performance are discussed.
机译:由于缺少浅的n型或p型掺杂剂,阻碍了在CVD金刚石上制造有源电子器件的成功。然而,利用该材料的固有形式的UV光电导体已经显示出有希望的可见的盲操作特性,并且显然存在这种性质的简单耐用的设备的市场。最近出现的近表面氢掺杂CVD材料表现出有用的室温电性能(p型,高载流子浓度,低活化能),已使制造具有良好电学特性的二极管和晶体管结构成为可能。本文报道了利用这些结构的两个有源光探测器的制造。金属半导体金属肖特基势垒器件(MSM)和光控场效应晶体管(OPFET)。比较了两种器件结构的性能,并讨论了它们在深紫外可见盲检测中的潜力。器件性能受到构成这些结构的欧姆结和肖特基结的接触特性的强烈影响。圆形传输线方法(c-TLM)已首次用于检查对氢化多晶CVD金刚石进行的不同欧姆金属化处理的特性,并讨论了其对改善器件性能的影响。

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