首页> 外文会议>Semiconductor Thermal Measurement and Management Symposium (SEMI-THERM), 2012 28th Annual IEEE >Thermal system identification (TSI): A methodology for post-silicon characterization and prediction of the transient thermal field in multicore chips
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Thermal system identification (TSI): A methodology for post-silicon characterization and prediction of the transient thermal field in multicore chips

机译:热系统识别(TSI):用于后硅表征和预测多核芯片中瞬态热场的方法

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This paper presents a methodology for post-silicon thermal prediction to predict the transient thermal field a multicore package for various workload considering chip-to-chip variations in electrical and thermal properties. We use time-frequency duality to represent thermal system in frequency domain as a low-pass filter augmented with a positive feedback path for leakage-temperature interaction. This thermal system is identified through power/thermal measurements on a packaged IC and is used for post-silicon thermal prediction. The effectiveness of the proposed effort is presented considering a 64 core processor in predictive 22nm node and SPEC2006 benchmark applications.
机译:本文提出了一种用于硅后热预测的方法,该方法可以预测多核封装在各种工作负载下的瞬态热场,并考虑到芯片之间芯片在电气和热性能方面的差异。我们使用时频对偶性将频域中的热系统表示为低通滤波器,并通过正反馈路径增强了泄漏-温度的相互作用。该热系统通过封装IC上的功率/热测量来识别,并用于后硅热预测。考虑到在预测的22nm节点和SPEC2006基准测试应用中使用64核处理器,提出的建议工作的有效性。

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