首页> 外文会议>Second International Symposium on Advanced Luminescent Materials and Quantum Confinement May 13-14, 2002 Philadelphia >SiGe PLANAR MICROCAVITIES WITH STRAIN-BALANCED SiGe/Si DISTRIBUTED BRAGG REFLECTORS
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SiGe PLANAR MICROCAVITIES WITH STRAIN-BALANCED SiGe/Si DISTRIBUTED BRAGG REFLECTORS

机译:具有应变平衡SiGe / Si分布布拉格反射镜的SiGe平面微腔

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摘要

SiGe planar microcavities with strain-balanced distributed Bragg reflectors (DBRs) were successfully grown on relaxed SiGe virtual substrates, and their optical properties were investigated. Strain balance of the SiGe/Si DBRs was confirmed by X-ray diffraction measurements and Raman spectroscopy, and a record reflectivity of 90% was achieved in a 38.5 pair sample. Spectral changes of photoluminescence due to the microcavity were observed as the excitation power was increased. Moreover, SiGe microcavities with top Si/CaF_2 DBRs showed the drastic intensity enhancement and the significant narrowing of spectral width was observed.
机译:具有应变平衡分布布拉格反射器(DBR)的SiGe平面微腔已成功地在松弛的SiGe虚拟衬底上生长,并研究了它们的光学特性。通过X射线衍射测量和拉曼光谱证实了SiGe / Si DBR的应变平衡,在38.5对样品中,反射率达到了创纪录的90%。随着激发功率的增加,观察到由于微腔引起的光致发光的光谱变化。此外,具有顶部Si / CaF_2 DBR的SiGe微腔显示出急剧的强度增强,并且观察到光谱宽度显着缩小。

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