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Analysis and design of a 3–26 GHz low-noise amplifier in SiGe HBT technology

机译:SiGe HBT技术中的3–26 GHz低噪声放大器的分析和设计

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摘要

The analysis and design of a wideband silicon-germanium (SiGe) heterojunction bipolar transistor (HBT) low noise amplifier (LNA) is presented. Resistive shunt-shunt feedback is employed to achieve wideband gain and matching characteristics and it is shown that the addition of small reactive elements can extend the bandwidth of the amplifier significantly. Measured data for the LNA, implemented in a 130-nm SiGe BiCMOS technology, show 9 dB gain with less than 1.0 dB variation across 3-26 GHz, and input and output return losses better than -10 dB over the entire bandwidth. The measured noise figure (NF) is less than 5 dB from 3-18 GHz and rises to only 6.5 dB at 24 GHz. In addition, the amplifier exhibits excellent linearity performance, with a input-referred third-order intercept point (IIP3) of 5.8 dBm and input-referred 1 dB compression point (P1dB) of -5.6 dBm. This SiGe amplifier occupies 0.48 mm2 (including pads) and consumes 33 mW of power while operating off a 3.3 V supply.
机译:提出了一种宽带硅锗(SiGe)异质结双极晶体管(HBT)低噪声放大器(LNA)的分析和设计。电阻分流反馈被用于实现宽带增益和匹配特性,结果表明,增加小电抗元件可以显着扩展放大器的带宽。采用130 nm SiGe BiCMOS技术实现的LNA的测量数据显示,在3-26 GHz范围内增益为9 dB,变化小于1.0 dB,并且在整个带宽上输入和输出回波损耗均优于-10 dB。在3-18 GHz范围内,测得的噪声系数(NF)小于5 dB,在24 GHz时仅上升至6.5 dB。此外,该放大器还具有出色的线性性能,输入参考的三阶交调点(IIP3)为5.8 dBm,输入参考的1 dB压缩点(P1dB)为-5.6 dBm。该SiGe放大器占用0.48 mm 2 (包括焊盘),在3.3 V电源下工作时功耗为33 mW。

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