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Electrical Isolation of Type Ⅱ InAs/InGaSb Superlattices from GaSb Substrates

机译:从GaSb衬底上电隔离Ⅱ型InAs / InGaSb超晶格

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摘要

We show here that n-type InAs/InGaSb superlattices can be electrically isolated from lightly doped n-type GaSb substrates at much higher temperatures than from the more common undoped p-type GaSb substrates without the use of a large band gap insulating buffer layer. Temperature dependent Hall effect measurements show superlattice conduction up to near room temperature, which is significantly higher than the 20 K observed for p-type substrates. Multi-carrier analysis of magnetic field dependent transport data demonstrate the absence of a substrate related conduction channel. We argue that the isolation is due to the depletion layer at the p-n junction between the p-type buffer layer and the n-type substrate.
机译:我们在这里表明,在不使用大带隙绝缘缓冲层的情况下,n型InAs / InGaSb超晶格可以在比更高掺杂的p型GaSb衬底高得多的温度下与轻掺杂n型GaSb衬底电隔离。随温度变化的霍尔效应测量结果显示,直至接近室温,超晶格的传导都明显高于p型衬底的20K。磁场相关的传输数据的多载波分析表明不存在与基质相关的传导通道。我们认为隔离是由于位于p型缓冲层和n型衬底之间的p-n结处的耗尽层引起的。

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  • 来源
    《Quantum sensing and nanophotonic devices XII》|2015年|937038.1-937038.6|共6页
  • 会议地点 San Francisco CA(US)
  • 作者单位

    Air Force Research Laboratory, Wright-Patterson Air Force Base, Ohio 45433, USA;

    Department of Physics, University of Dayton, Dayton, Ohio 45469, USA;

    Air Force Research Laboratory, Wright-Patterson Air Force Base, Ohio 45433, USA;

    Department of Physics, University of Dayton, Dayton, Ohio 45469, USA;

    Air Force Research Laboratory, Wright-Patterson Air Force Base, Ohio 45433, USA;

    Air Force Research Laboratory, Wright-Patterson Air Force Base, Ohio 45433, USA;

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  • 正文语种 eng
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