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Growth of large-area high-quality CdZnTe substrates by the computer-controlled vertical Bridgman method

机译:通过计算机控制的垂直Bridgman方法生长大面积高质量CdZnTe衬底

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Abstract: The reproducible growth of large, high-quality CdZnTe crystals is crucial for providing low- cost substrates for IR focal plane arrays. We have grown 3-kg, 6.4-cm diameter Cd$- 1$MIN@x$/Zn$-x$/Te (x 0.04) ingots by the vertical Bridgman method, from which we have obtained large-area wafers that can yield single-crystal, twin-free substrates up to 4 cm $MUL 6 cm. The computer-controlled thermal environment was designed to reduce thermal stresses both on the solidified boule and at the melt/solid interface. The ampoule was constructed to reduce the excess Te concentration without active atmosphere control. FTIR transmission spectra of these wafers exhibited 65% transmission from 2.5 $mu@m to 20 $mu@m across the entire wafer. Glow discharge mass spectrometry (GDMS) confirmed that the concentrations of detrimental impurities were 3 $MUL 10$+14$/ cm$+$MIN@3$/. X-ray synchrotron topography showed that the substrates contained large-area subgrains with minimal residual strain at the boundaries. We discuss the suitability of these substrates for LPE growth of Hg$-1$MIN@y$/Cdx$-y$/Te (y 0.2) epilayers. !31
机译:摘要:大型,高质量CdZnTe晶体的可再现生长对于为IR焦平面阵列提供低成本衬底至关重要。我们通过垂直Bridgman方法生长了3千克,直径6.4厘米的Cd $ -1 $ MIN @ x $ / Zn $ -x $ / Te(x 0.04)铸锭,从中我们获得了可以产生单晶,无孪晶的衬底,最大4 cm – MUL 6 cm。设计了计算机控制的热环境,以减少固化晶锭和熔体/固体界面上的热应力。安瓿瓶可在不进行主动气氛控制的情况下降低多余的Te浓度。这些晶片的FTIR透射光谱在整个晶片上显示出从2.5μm至20μm的65%的透射率。辉光放电质谱法(GDMS)证实有害杂质的浓度为3 $ MUL 10 $ + 14 $ / cm $ + $ MIN @ 3 $ /。 X射线同步加速器形貌表明,基底包含大面积的亚晶粒,在边界处具有最小的残余应变。我们讨论了这些底物对于Lpe生长Hg $ -1 $ MIN @ y $ / Cdx $ -y $ / Te(y 0.2)外延层的适用性。 !31

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