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Analysis of Cu(I) Complexes in Copper Sulfate Electroplating Solution by Using Reaction Kinetics with a Chelate Reagent

机译:螯合剂反应动力学分析硫酸铜电镀液中的Cu(I)配合物

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Cu(I) in electroplating solutions was analyzed by absorption of a chelate of Cu(I) with balhocuproinedisulfonic acid, disodium salt (BCS). The absorbance of the color reaction of Cu(I) increased quickly in a few minutes after mixing with BCS and subsequently continued to increase slowly. Cu(I)-PEG (polyethylene glycol) complexes with different chain lengths were detected using MALDI-MS. Results show that Cu(I) ions exist not only as small complexes but also as large complexes with PEG. We divided Cu(I) complexes into two groups, small and large complexes, and assumed the color reaction is a first order reaction with a specific reaction rate constant and simulated the absorption curve with a good correlation and obtained the concentrations and the time constants, inverse of rate constants, of small and large complexes. These are important parameters to control plating solutions. Using this analysis, we monitored the variation of Cu(I) concentrations in production lines for one month.
机译:电镀溶液中的Cu(I)通过用Balhocuproinedisulfonic磺酸二钠盐(BCS)吸收Cu(I)的螯合物进行分析。与BCS混合后几分钟,Cu(I)显色反应的吸光度迅速增加,随后继续缓慢增加。使用MALDI-MS检测到具有不同链长的Cu(I)-PEG(聚乙二醇)复合物。结果表明,Cu(I)离子不仅与PEG呈小络合物存在,而且也呈大络合物存在。我们将Cu(I)配合物分为大,小两种,并假设显色反应是具有特定反应速率常数的一级反应,并模拟了具有良好相关性的吸收曲线,并得出了浓度和时间常数,大小复合体的速率常数的倒数。这些是控制电镀液的重要参数。使用此分析,我们监测了生产线中Cu(I)浓度在一个月内的变化。

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    Measurement Solution Research Center, National Institute of Advanced Industrial Science and Technology (AIST), 807-1, Shuku-machi, Tosu, Saga 841-0052 Japan;

    Measurement Solution Research Center, National Institute of Advanced Industrial Science and Technology (AIST), 807-1, Shuku-machi, Tosu, Saga 841-0052 Japan;

    Measurement Solution Research Center, National Institute of Advanced Industrial Science and Technology (AIST), 807-1, Shuku-machi, Tosu, Saga 841-0052 Japan;

    Measurement Solution Research Center, National Institute of Advanced Industrial Science and Technology (AIST), 807-1, Shuku-machi, Tosu, Saga 841-0052 Japan;

    Measurement Solution Research Center, National Institute of Advanced Industrial Science and Technology (AIST), 807-1, Shuku-machi, Tosu, Saga 841-0052 Japan;

    Design Production Engineering Department, Sumitomo Electric Printed Circuits, Inc., 30 Hinokigaoka, Minakuchi-cho, Koka, Shiga 528-0068, Japan;

    Design Production Engineering Department, Sumitomo Electric Printed Circuits, Inc., 30 Hinokigaoka, Minakuchi-cho, Koka, Shiga 528-0068, Japan;

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