PROCESS OPTIMIZATION FOR MICROBOLOMETERS FABRICATION

摘要

This work presents a process development fabrication of surface-micromachined microbolometers made of poly crystal line silicon, in order to obtain a device with high infrared absorption. The most important processes for success of the bolometer production and that can commit the sensors operation more seriously are the deposition of the porous gold layer, that it is used as infrared absorber, and the poly Si etching to form the resistive devices. We will present the most appropriate deposition process to porous gold for applications in far-infrared detection and comparisons among wet etching and plasma etching of the poly Si. The detection of radiation in the range of submillimeter and far infrared wavelengths has various applications in remote passive radiometric sensing such as imaging of field targets, power line surveys, night vision. The first applications considered are measurements of atmospheric propagation, solar imaging and tentative detection of solar transients in the selected bands.