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SINGLE CRYSTAL GROWTH OF GALLIUM NITRIDE BY SLOW-COOLING OF ITS CONGRUENT MELT UNDER HIGH PRESSURE

机译:高压下其同形熔体的慢冷冷却使氮化镓单晶生长

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摘要

Single crystals of GaN were successfully synthesized by slowly cooling its stoichiometric melt under high pressure. Applying high pressures above 6.0 GPa prevented decomposition and allowed the congruent melt of GaN at 2220℃, which was confirmed by an in situ x-ray diffraction study. Using a cubic-anvil-type, large volume, high-pressure apparatus and a GaN powder as a starting material, single crystal growth was achieved by reducing the temperature from 2400℃ at 6.5 GPa. The x-ray rocking curve of the recovered sample showed a very narrow line width, less than 30 arcsec, suggesting a low dislocation density. Bulk specimens of Al_xGa_(1-x)N alloys, which covered a composition range of 0 ≤ x ≤ 1 were also synthesized under high pressures.
机译:通过在高压下缓慢冷却其化学计量的熔体,成功地合成了GaN单晶。通过在原位X射线衍射研究中证实,施加高于6.0 GPa的高压可防止分解,并使GaN在2220℃熔化。使用立方砧型,大体积,高压设备和GaN粉作为原材料,通过将温度从6.5 GPa降低到2400℃,实现了单晶生长。回收样品的X射线摇摆曲线显示非常窄的线宽,小于30 arcsec,表明位错密度低。还在高压下合成了覆盖范围为0≤x≤1的Al_xGa_(1-x)N合金大块试样。

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