首页> 外文会议>2018年第79回応用物理学会秋季学術講演会講演予稿集 >Tuning Up or Down the Critical Thickness in LaAlO_3/SrTiO_3 through In-Situ Deposition of Metal Overlayers
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Tuning Up or Down the Critical Thickness in LaAlO_3/SrTiO_3 through In-Situ Deposition of Metal Overlayers

机译:通过金属覆盖层的原位沉积来调整或降低LaAlO_3 / SrTiO_3的临界厚度

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The quasi 2D electron system (q2DES) that forms at the interface between LaAlO_3 and SrTiO_3 has attractedmuch attention from the oxide electronics research field. One of its hallmark features is the existence of a criticalLaAlO_3 thickness of 4 unit-cells (u.c.) for interfacial conductivity to emerge. In this study, the chemical,electronic, and transport properties of LaAlO_3/SrTiO_3 samples capped with different metals grown in a systemcombining pulsed laser deposition, sputtering, and in situ X-ray photoemission spectroscopy are investigated.The results show in Fig. 1 that for metals with low work function a q2DES forms at 1 – 2 u.c. of LaAlO_3 and isaccompanied by a partial oxidation of the metal, a phenomenon that affects the q2DES properties and triggersthe formation of defects. In contrast, for noble metals, the critical thickness is increased above 4 u.c. The resultsare discussed in terms of a hybrid mechanism that incorporates electrostatic and chemical effects.
机译:在LaAlO_3与SrTiO_3之间的界面上形成的准二维电子系统(q2DES)已吸引 氧化物电子学研究领域备受关注。它的标志性特征之一是存在关键 LaAlO_3的厚度为4个单位晶胞(u.c.),以产生界面导电性。在这项研究中,化学物质 系统中生长的不同金属覆盖的LaAlO_3 / SrTiO_3样品的电子和输运性质 结合脉冲激光沉积,溅射和原位X射线光发射光谱进行了研究。 结果如图1所示,对于功函数低的金属,q2DES在1-2 u.c形成。的LaAlO_3且为 伴随着金属的部分氧化,这种现象会影响q2DES属性并触发 缺陷的形成。相反,对于贵金属,临界厚度增加到4 u.c.以上。结果 结合静电和化学效应的混合机理进行了讨论。

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