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Design re-use: where is the productivity going to come from?

机译:设计重用:生产力将从何而来?

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摘要

Semiconductor process geometries are shrinking and the availablesilicon capacity is growing at an amazing pace. Consumerization andconvergence applications are causing tremendous time to marketpressures, resulting in increased product complexity and reduced designcycle times. The gap between what can be built (silicon capacity) andwhat can be designed is widening. This `design productivity gap' iscausing an industry-wide shift to system-on-a-chip (SOC) designmethodology. The corner-stone for success of the SOC methodology isdesign re-use. The methodology for design re-use will evolve goingforward. Huge investments will be made to setup infrastructure andmethodologies for creation of re-usable designs and their integrationinto future products. But, will they deliver the expected productivitygains? This talk presents a progression of re-use methodologyalternatives and the key characteristics and productivity impact of eachapproach
机译:半导体工艺的几何尺寸正在缩小,可用硅的容量正以惊人的速度增长。消费化和融合应用程序导致了巨大的市场压力,导致产品复杂性增加,设计周期缩短。可建造的东西(硅的容量)和可设计的东西之间的差距正在扩大。这种“设计生产力差距”导致了整个行业范围内向片上系统(SOC)设计方法的转变。 SOC方法成功的基石是设计重用。设计重用的方法将不断发展。将进行大量投资来建立基础架构和方法,以创建可重复使用的设计并将其集成到将来的产品中。但是,它们能否带来预期的生产率提高?本演讲介绍了重复使用方法的进展以及每种方法的关键特征和生产率影响

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