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PVD-Al2O3-coated cemented carbide cutting tools

机译:PVD-Al2O3涂层硬质合金刀具

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With the introduction of the bipolar pulsed dual magnetron sputtering (BP-DMS) technique, a wide range of opportunities has opened up for the deposition of insulating layers such as Al2O3 as well as of conductive compound layers such as TixAl1u0001xN. In BP-DMS, two magnetrons in a pair alternately act as a cathode and an anode; during the cathode phase, the target is sputter-cleaned, hence ensuring a metallic surface during the anode phase and a stable long-term operation. At high-enough frequencies (25–50 kHz), possible electron charging of insulating layers will be suppressed and the otherwise troublesome phenomenon of arcing will be limited. The BP-DMS method has made it possible to deposit hard (N2000 HV) nanocrystalline g-Al2O3 textured in the [440] direction at substrate temperatures as low as 700 8C, which is a much lower temperature than the conventional chemical vapor deposition (CVD) temperatures (1000–1050 8C) for the deposition of the Al2O3 polymorphs a and n. In this paper, a study of the process, in terms of recording the process characteristic data and evaluating the influence of magnetic field, has been done. For a set of parameters, cemented carbide cutting inserts have been coated and tested. Inserts with a double layer of g-Al2O3 and TiAlN or TiN have been evaluated in cutting operations such as turning, threading, and end-milling, often with machining conditions (cutting data) more suitable for physical vapor deposition (PVD)- than CVD-coated tools. Some results are presented in this paper. It has been shown that the addition of a 2-Am-thick g-Al2O3 layer decreases the wear rate. The g-Al2O3/TiAlN (TiN)-coated inserts exhibit tool lives longer than the single-coated inserts especially at higher cutting speeds.
机译:随着双极脉冲双磁控溅射(BP-DMS)技术的引入,为绝缘层(如Al2O3)以及导电化合物层(如TixAl1u0001xN)的沉积开辟了广泛的机会。在BP-DMS中,成对的两个磁控管交替充当阴极和阳极。在阴极阶段,靶被溅射清洗,从而确保了阳极阶段的金属表面和稳定的长期运行。在足够高的频率(25–50 kHz)下,将抑制绝缘层可能的电子充电,并限制否则会引起电弧的麻烦现象。 BP-DMS方法使得可以在低至700 8C的基板温度下沉积沿[440]方向织构的硬质(N2000 HV)纳米晶g-Al2O3,该温度远低于传统的化学气相沉积(CVD) )温度(1000–1050 8C)以沉积Al2O3多晶型物a和n。本文从记录过程特征数据和评估磁场影响方面对过程进行了研究。对于一组参数,硬质合金切削刀片已经过涂层和测试。已在切削操作(例如车削,螺纹加工和端铣)中对具有g-Al2O3和TiAlN或TiN双层的刀片进行了评估,通常采用比CVD更适合物理气相沉积(PVD)-的加工条件(切削数据)涂层的工具。本文提出了一些结果。已经表明,添加2-Am厚的g-Al2O3层降低了磨损率。带g-Al2O3 / TiAlN(TiN)涂层的刀片比单层刀片具有更长的刀具寿命,尤其是在更高的切削速度下。

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