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Leakage - Delay Tradeoff in Wide-Bit Nanoscale CMOS Adders C

机译:泄漏-宽位纳米级CMOS加法器中的延迟权衡C

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The scaling of nanometer technology has had a major impact on the power dissipation of CMOS circuits. As transistor size decreases it has become apparent that leakage power is becoming a dominant fighting force against future technology. In this paper the importance of static power consumption on the design of new and advanced CMOS technology is explored with the investigation of leakage power reduction techniques and their implementation on embedded CMOS adder circuits. Four different adder topologies of bit sizes 16, 32 and 64, were implemented using technology nodes 22nm, 32nm, and 45nm. To reduce the leakage power dissipation of these adders three different types of leakage reduction techniques were implemented and simulated using Hspice to determine the leakage and delay. The results were analyzed and the optimal leakage reduction technique(s) for each nanometer adder design was determined.
机译:纳米技术的规模化对CMOS电路的功耗产生了重大影响。随着晶体管尺寸的减小,很明显,泄漏功率正在成为对抗未来技术的主导力量。本文通过研究泄漏功率降低技术及其在嵌入式CMOS加法器电路中的实现,探索了静态功耗在新型和先进CMOS技术设计中的重要性。使用技术节点22nm,32nm和45nm实现了四种不同的位大小为16、32和64的加法器拓扑。为了减少这些加法器的泄漏功耗,实施了三种不同类型的泄漏减少技术,并使用Hspice对其进行了仿真,以确定泄漏和延迟。分析结果,并确定每种纳米加法器设计的最佳泄漏减少技术。

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