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A 'Cook's Tour' of Two Decades of Research into the Optical Properties of Nanostructured Silicon Materials

机译:纳米结构硅材料光学性能研究的两个十年的“一次烹饪之旅”

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Amongst a number of diverse approaches to engineering efficient light emission in silicon nanostructures, one system that has received considerable attention has been Si/SiO_2 quantum wells. Engineering such structures has not been easy, because to observe the desired quantum confinement effects, the quantum well thickness has to be less than 5 nm. Nevertheless, such ultra thin structures have now been produced by a variety of techniques. The SiO_2 layers are amorphous, but the silicon layers can range from amorphous through nanocrystalline to single-crystal form. The fundamental band gap of the quantum wells has been measured primarily by optical techniques and strong confinement effects have been observed. A detailed comparison is made between theoretical and experimental determinations of the band gap in Si/SiO_2 quantum wells. The review article is prefaced with a historical account of the Pits and Pores Symposium series and a personal academic history of the author.
机译:在用于设计硅纳米结构中的有效发光的多种多样的方法中,一种受到广泛关注的系统是Si / SiO_2量子阱。对这样的结构进行工程设计并不容易,因为要观察所需的量子限制效应,量子阱的厚度必须小于5 nm。尽管如此,现在已经通过多种技术生产了这种超薄结构。 SiO 2层是非晶的,但是硅层的范围可以从非晶到纳米晶再到单晶形式。量子阱的基本带隙主要是通过光学技术测量的,并且观察到了强烈的限制效应。在理论和实验确定的Si / SiO_2量子阱中的带隙之间进行了详细的比较。这篇评论文章的开头是《坑与洞》研讨会系列的历史叙述和作者的个人学术史。

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