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Sensitization of Porous Silicon with Germanium Quantum Dots for Up-Conversion of Low Energy Photons via Intermediate Band for Third Generation Solar Cells

机译:用锗量子点敏化多孔硅,以通过中间带将低能光子上转换为第三代太阳能电池

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Incorporation of germanium quantum dots (QDs) in porous silicon (PS) promises foundation of efficient intermediate band (IB) within the bandgap of the host material. We have developed the idealized model for such material system intended to be used for third generation solar cells. We solved Schrodinger equation for a chain of Ge nanodots embedded in a pore of columnar porous silicon material. We have shown that holes induce narrow energy band lined up with the forbidden band gap of Si and spreads over some distance from the chain into Si. The last feature is very desirable for efficient operation of IB structure associated with PS solar cells.
机译:在多孔硅(PS)中掺入锗量子点(QD)有望在基质材料的带隙内建立有效的中间带(IB)。我们已经开发了用于第三代太阳能电池的材料系统的理想模型。我们针对嵌入在柱状多孔硅材料的孔中的Ge纳米点链求解了Schrodinger方程。我们已经表明,空穴感应出的窄能带与Si的禁带隙对齐,并在从链到Si的一定距离内扩散。对于与PS太阳能电池相关的IB结构的有效运行,最后一个功能非常理想。

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