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Analysis of grating profiles of phase holograms recorded in silver halide emulsions and processed with combinations of various developers and bleaching agents

机译:分析记录在卤化银乳剂中并经各种显影剂和漂白剂组合处理的相全息图的光栅轮廓

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A large number of plane-wave holograms were recorded in Agfa-Gevaert 8E75HD holographic plates, at a wide range of bias exposures and fringe visibilities. The plates were processed by various combinations of developers (AAC, Pyrogallol and Catechol) and bleaching agents (R-9 and EDTA). The phase gratings were studied by phase-contrast microscopy, using a high-power immersion (100 X) objective. The phase contrast photomicrographs were Fourier-analyzed. Thus first- second- and third-order modulation of the refractive index as a function of the bias exposure and the visibility of the recording interference pattern could be determined. The ratio of the amplitudes of the higher-order modulations to that of the first-order one can serve as a measure of the nonlinearity of the holographic recording.
机译:在Agfa-Gevaert 8E75HD全息照相版中记录了许多平面波全息图,其偏光曝光和条纹可见性范围很广。通过显影剂(AAC,邻苯三酚和邻苯二酚)和漂白剂(R-9和EDTA)的各种组合对印版进行处理。使用高功率浸入式(100 X)物镜,通过相差显微镜研究了相位光栅。相衬显微照片进行了傅里叶分析。因此,可以确定作为偏置曝光和记录干涉图案的可见度的函数的折射率的第一,第二和第三阶调制。高阶调制的幅度与一阶调制的幅度之比可以用作全息记录的非线性的量度。

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