METHOD FOR TREATING PHOTOSENSITIVE SILVER HALIDE MATERIAL FOR HOLOGRAM, AND BLEACHED PHASE HOLOGRAM OBTAINED USING THIS TREATMENT METHOD

摘要

The present invention addresses the problem of providing a method for treating a photosensitive silver halide material that is used to produce a bleached phase hologram which has excellent light resistance and by which high diffraction efficiency can be achieved even after long term storage, and providing a bleached phase hologram which is obtained using this treatment method, which has excellent light resistance and by which high diffraction efficiency can be achieved. The problem can be solved by providing a method for treating a photosensitive silver halide material for a hologram in order to obtain a bleached phase hologram in which the difference between absorbance at a wavelength of 420 nm and absorbance at a wavelength of 470 nm is 2 or higher in transmission/absorption spectrometry. The treatment method includes a step of exposing the photosensitive silver halide material for a hologram, which has a silver halide emulsion layer that contains a photosensitive silver halide emulsion on a support body, to light, carrying out developing treatment and then bleaching treatment using ethylenediaminetetraacetic acid or a salt thereof as a bleaching treatment material, and then carrying out a stabilization treatment step using an aqueous solution of potassium iodide.