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Analysis of grating profiles of phase holograms recorded in silver halide emulsions and processed with combinations of various developers and bleaching agents

机译:在卤化银乳液中记录的相全息图的光栅谱分析,并用各种显影剂和漂白剂的组合处理

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A large number of plane-wave holograms were recorded in Agfa-Gevaert 8E75HD holographic plates, at a wide range of bias exposures and fringe visibilities. The plates were processed by various combinations of developers (AAC, Pyrogallol and Catechol) and bleaching agents (R-9 and EDTA). The phase gratings were studied by phase-contrast microscopy, using a high-power immersion (100 X) objective. The phase contrast photomicrographs were Fourier-analyzed. Thus first- second- and third-order modulation of the refractive index as a function of the bias exposure and the visibility of the recording interference pattern could be determined. The ratio of the amplitudes of the higher-order modulations to that of the first-order one can serve as a measure of the nonlinearity of the holographic recording.
机译:在Agfa-Gevaert 8E75HD全息图中记录了大量的平面波全息图,在各种偏置曝光和边缘可见度。通过显影剂(AAC,吡羟基洛尔和儿茶酚)和漂白剂(R-9和EDTA)的各种组合处理板。通过相对造影显微镜研究相位光栅,使用高功率浸没(100 x)物镜。相位对比显微照片傅立叶分析。因此,可以确定作为偏置曝光的函数的折射率和记录干涉图案的可视性的折射率的第一阶和三阶调制。高阶调制的幅度与一阶的幅度的比率可以用作全息记录的非线性的量度。

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