Optimizing Anatase-TiO_2 Deposition for Low-loss Planar Waveguides

摘要

Polycrystalline anatase-TiO_2 thin film possesses desirable properties for on-chip photonic devices that can be used for optic computing, communication, and sensing. Low-loss anatase-TiO_2 thin films are necessary for fabricating high quality optical devices. We studied anatase-TiO_2 by reactively sputtering titanium metal in an oxygen environment and annealing. By correlating key deposition parameters, including oxygen flow rate, deposition pressure, RF power, and temperature to film morphology and planar waveguiding losses, we aim to understand the dominant source of propagation losses in TiO_2 thin films and achieve higher quality, lower-loss films.