首页> 外文会议>Optoelectronic Devices: Physics, Fabrication, and Application III; Proceedings of SPIE-The International Society for Optical Engineering; vol.6368 >Synthesis and Optimization of Luminescent Si Nanoparticles by CO_2 Laser Annealing and Si Nanocrystal Light Emission in Microcavities
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Synthesis and Optimization of Luminescent Si Nanoparticles by CO_2 Laser Annealing and Si Nanocrystal Light Emission in Microcavities

机译:微腔中CO_2激光退火和硅纳米晶发光的合成与优化发光硅纳米粒子

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We report synthesis and photoluminescence optimization of luminescent Si nanocrystals in silicon rich oxide films using a CO_2 laser beam. Laser annealing allows for a very localized heat deposition. This results in appreciable temperature rise in an area that is equivalent to only a few spot sizes. This could be important in CMOS back-end compatible processing where high temperatures on the entire wafer scale might not be acceptable. Furthermore, temperature optimization studies in furnace annealing are time consuming because the furnaces have to be programmed to each individual temperature and the stabilization takes long times. In CO_2 laser annealing, the entire temperature range for nanocrystal formation is available along the radial and axial directions of the laser spot - thereby allowing temperature optimization in a single short experiment. Presence of crystalline nanoparticles is ascertained using structural analysis techniques like transmission electron microscopy (TEM) and X-ray photoelectron spectroscopy (XPS). We also report luminescence optimization with respect to laser power and annealing time. It is observed that laser annealing in an air ambient results in two peaks in the luminescence spectrum — on in the visible at 570 nm and one in the near infra read at 800 nm. Origin of luminescence in these two peaks is probed by hydrogen passivation and time resolved measurements. In the second part of the paper, we focus on continuous wave characterization of photoluminescence from Si nanocrystals embedded in microdisk resonators. There have been numerous reports on observation of continuous-wave and transient gain in planar optical waveguides with Si nanocrystal active layer. However, there are relatively very few investigations focusing on photoluminescence emission from Si nanocrystals (quantum dots) embedded in on-chip optical microcavities. Microcavities spectrally filter the luminescence from the quantum dots and, depending on the (Q/V) ratio, can significantly alter the spontaneous photoemission from the quantum confined excitons. In our work, planar microcavities are patterned on the emitter layer by high resolution electron beam lithography and a combination of dry and wet chemical etching. Fabrication procedure is optimized to maximize the ratio of the quality factor and the mode volume. Continuous-wave photoluminescence measurements are performed by top-pumping the resonators with a 488 nm line of an argon ion laser. We study the photoemission from the microdisks for the polarization dependence, and quality factors. Contributions of various mechanisms leading to the observed loss are estimated. We believe that our studies will help gain further insight into photoemission physics of the group-IV nanostructures.
机译:我们报告使用CO_2激光束的富硅氧化膜中的发光Si纳米晶体的合成和光致发光优化。激光退火允许非常局部的热沉积。这导致在仅相当于几个光斑大小的区域中出现明显的温度上升。这在CMOS后端兼容处理中可能很重要,因为整个晶圆级的高温可能无法接受。此外,由于必须将熔炉编程到每个单独的温度并且稳定需要很长时间,因此在熔炉退火中进行温度优化研究非常耗时。在CO_2激光退火中,沿着激光点的径向和轴向可获得用于形成纳米晶体的整个温度范围-从而可以在一个简短的实验中优化温度。使用结构分析技术,例如透射电子显微镜(TEM)和X射线光电子能谱(XPS),可以确定晶体纳米颗粒的存在。我们还报告了关于激光功率和退火时间的发光优化。可以看出,在空气环境中进行激光退火会导致发光光谱中出现两个峰-在570 nm处可见,在800 nm处近红外下。通过氢钝化和时间分辨测量来探测这两个峰中的发光源。在本文的第二部分中,我们重点研究嵌入在微盘谐振器中的Si纳米晶体的光致发光的连续波表征。关于具有Si纳米晶体活性层的平面光波导中的连续波和瞬态增益的观察,已有大量报道。然而,很少有研究集中在嵌入在芯片上光学微腔中的Si纳米晶体(量子点)的光致发光方面。微腔在光谱上过滤了量子点的发光,并且取决于(Q / V)比率,可以显着改变量子限制激子的自发光发射。在我们的工作中,通过高分辨率电子束光刻以及干法和湿法化学蚀刻的组合,在发射极层上对平面微腔进行构图。优化了制造过程,以最大程度地提高品质因数和模式体积的比率。连续波光致发光测量是通过用488 nm的氩离子激光线对泵谐振器进行顶部泵浦来进行的。我们研究了微盘的光发射的偏振依赖性和质量因数。估计导致观察到的损失的各种机制的贡献。我们相信,我们的研究将有助于进一步了解IV型纳米结构的光发射物理学。

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