Application of the aerial image measurement system (AIMS)TM to theanalysis of binary mask imaging and resolution enhancement techniques,

摘要

Abstract: The newly developed Aerial Image Measurement System (AIMS$+TM*$/) was used to quantify the lithographic benefits of several resolution enhancement techniques as compared to standard binary mask imaging. This system, a microscope based stepper emulator, permits rapid characterization of mask images from both binary and phase shifted mask (PSM) patterns at multiple focal planes. The resultant images are captured digitally with a CCD camera and analyzed using an exposure-defocus tree technique to quantify the depth-of-focus as a function of exposure latitude. The AIMS is used to extract both phase and transmission errors from captured aerial images of all the masks evaluated. AIMS results are compared to wafer electrical linewidth data. A 0.5 numerical aperture (NA) DUV stepper was used with a partial coherence of 0.6 combined with IBM APEX-E resist process. Collected data were analyzed using techniques identical to the AIMS analysis, allowing for a high level of consistency. Comparative data focused on binary mask imaging for the verification of the AIMS results. Trends associated with feature sizes and types are discussed. !9