IBM Semiconductor Research and Development Center, Hopewell Junction NY, USA;
IBM Albany Nano Technology Center, Albany NY, USA;
IBM Almaden Research Center, Almaden , CA, USA;
IBM Semiconductor Research and Development Center, Hopewell Junction NY, USA;
IBM Albany Nano Technology Center, Albany NY, USA;
IBM Albany Nano Technology Center, Albany NY, USA;
IBM Yorktown Research Center, Yorktown Height, NY, USA;
IBM Yorktown Research Center, Yorktown Height, NY, USA;
IBM Almaden Research Center, Almaden , CA, USA;
IBM Almaden Research Center, Almaden , CA, USA;
IBM Almaden Research Center, Almaden , CA, USA;
IBM Almaden Research Center, Almaden , CA, USA;
IBM Semiconductor Research and Development Center, Hopewell Junction NY, USA;
IBM Semiconductor Research and Development Center, Hopewell Junction NY, USA;
IBM Semiconductor Research and Development Center, Hopewell Junction NY, USA;
Optical Lithography; Computational Lithography; Directed Self Assembly; Optical Proximity Correction; Optical extension; Mask Decomposition; DSA model; compact model; Source Mask Optimization; Lithography Optimization;
机译:通过软光刻模板和定向自组装的可见光范围内的机理表面晶格共振
机译:使用极性转换光刻胶将定向自组装与光学光刻相集成的简单通用方法
机译:定向自组装光刻技术的设计技术协同优化评估:定向自组装设计还是设计定向自组装?
机译:通过定向自组装的光学光刻延伸的计算方面
机译:先进光刻的嵌段共聚物定向自组装的计算研究。
机译:阐明具有飞秒光学镊子的均匀与异质纳米单元的光学场的光学场自相组装
机译:通过软光刻模板和定向自组装的可见光范围内的机械机械表面晶格共振