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Improved Rate Control for E-beam Evaporation andEvaluation of Optical Performance Improvements

机译:改进的电子束蒸发速率控制和光学性能改进评估

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摘要

A new deposition rate control and E-gun strategy has been developed whichrnsignificantly reduces the growth rate variations for E-beam deposited SiO2 coatings. The reducedrngrowth variations are shown to greatly improve the optical performances of two multilayeredrnbandpass filters.
机译:已经开发了一种新的沉积速率控制和电子枪策略,该策略显着降低了电子束沉积SiO2涂层的生长速率变化。减小的生长变化被显示为极大地改善了两个多层带通滤波器的光学性能。

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  • 来源
  • 会议地点 Tucson AZ(US)
  • 作者单位

    Manufacturing Engineering Department, Boston University, 15 Saint Mary's Street, Brookline, Massachusetts, 02446rngevelber@bu.edu;

    Manufacturing Engineering Department, Boston University, 15 Saint Mary's Street, Brookline, Massachusetts, 02446;

    Vacuum Process Technology Inc., 70 Industrial Park Road, Plymouth, Massachusetts, 02360;

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  • 正文语种 eng
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