首页> 外文会议>NSTI Nanotechnology Conference and Trade Show(NSTI Nanotech 2005) vol.3; 20050508-12; Anaheim,CA(US) >2D Quantum Mechanical Device Modeling and Simulation: Single and Multi-fin FinFET
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2D Quantum Mechanical Device Modeling and Simulation: Single and Multi-fin FinFET

机译:二维量子机械设备建模与仿真:单鳍和多鳍FinFET

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We propose a novel device structure (Si_(1-x)Ge_x/Si/Si_(1-x) Ge_x hetero-structure), which is called "center-channel (CC) double-gate (DG) MOSFET,". The device performance of the proposed FET structure was investigated with our two-dimensional quantum-mechanical simulator which is based upon the self-consistent solution of Poisson-Schroedinger equations and the current continuity equation. The CC operation of CC-NMOS is confirmed by considering the band lineups as well as the lowest energy wave function. Especially, the lowest energy wave function of CC-MOSFET is carefully compared with those of the conventional DG-NMOS in order to observe the distinct feature of the proposed FET structure. Furthermore, device optimization for the CC operation and short-channel effects (SCE) was performed in terms of Ge concentration, gate length (L_g), and Si_(1-x)Ge_x/Si/Si_(1-x)Ge_x scale variation.
机译:我们提出了一种新颖的器件结构(Si_(1-x)Ge_x / Si / Si_(1-x)Ge_x异质结构),称为“中心沟道(CC)双栅(DG)MOSFET”。利用我们的二维量子力学模拟器,研究了拟议的FET结构的器件性能,该模拟器基于Poisson-Schroedinger方程和电流连续性方程的自洽解。通过考虑能带排列以及最低的能量波函数来确定CC-NMOS的CC操作。特别是,仔细观察了CC-MOSFET的最低能量波函数与常规DG-NMOS的能量波函数,以便观察所提出的FET结构的独特特征。此外,根据Ge浓度,栅极长度(L_g)和Si_(1-x)Ge_x / Si / Si_(1-x)Ge_x比例变化对CC操作和短沟道效应(SCE)进行了器件优化。 。

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