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2D Quantum Mechanical Device Modeling and Simulation: Single and Multi-fin FinFET

机译:2D量子机械设备建模与仿真:单鳍多鳍FINFET

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We propose a novel device structure (Si_(1-x)Ge_x/Si/Si_(1-x) Ge_x hetero-structure), which is called "center-channel (CC) double-gate (DG) MOSFET,". The device performance of the proposed FET structure was investigated with our two-dimensional quantum-mechanical simulator which is based upon the self-consistent solution of Poisson-Schroedinger equations and the current continuity equation. The CC operation of CC-NMOS is confirmed by considering the band lineups as well as the lowest energy wave function. Especially, the lowest energy wave function of CC-MOSFET is carefully compared with those of the conventional DG-NMOS in order to observe the distinct feature of the proposed FET structure. Furthermore, device optimization for the CC operation and short-channel effects (SCE) was performed in terms of Ge concentration, gate length (L_g), and Si_(1-x)Ge_x/Si/Si_(1-x)Ge_x scale variation.
机译:我们提出了一种新颖的设备结构(SI_(1-x)ge_x / si / si_(1-x)ge_x异质结构),其被称为“中心通道(CC)双栅极(DG)MOSFET”。采用我们的二维量子机械模拟器研究了所提出的FET结构的装置性能,该模拟器基于泊松 - 施罗德格方程的自我一致性解决方案和当前连续性方程。通过考虑带阵容以及最低能量波函数来确认CC-NMOS的CC操作。特别地,与传统的DG-NMOS的那些仔细地比较CC-MOSFET的最低能量波函数,以观察所提出的FET结构的不同特征。此外,在GE浓度,栅极长度(L_G)和SI_(1-X)GE_X / SI_(1-X)GE_X比例变化方面执行CC操作和短信效果(SCE)的设备优化(SCE) 。

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