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Metal Induced Intershell Coupling and Conductance Enhancement in Multiwalled Carbon Nanotubes

机译:多壁碳纳米管中金属诱导的壳间偶联和电导率增强

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Using two different metal (platinum and Tungsten) depositions on the individual multiwalled carbon nanotubes bridging the spacing between two gold electrodes, we segregate the contributions of change in nanotubes inherent properties and contact-improvement in total conductance enhancement caused by metal deposition. In these experiments, the metals were deposited precisely at the desired locations on the tubes using gas injection system available in the Raithl50-Two direct write setup with 3 KeV electron beam induced deposition using organometallic precursor trimethyl- methylcyclopentadienyl-platinum (for Pt) and tungsten hexacarbonyl (for W). Typical increment up to 140% to 540% in conductance has been observed after Pt and W metal depositions on the MWNTs. The change in conductance is explained in terms of change in the density of states at Fermi level, due to charge transfer between metal atoms and nanotube as well as by radial stress created on the tube. HRTEM investigation of the metal deposited tubes suggests that metal atoms diffuse within the deep shells of the tube causing increased intershell interactions and hence improved electrical conductance.
机译:在桥接两个金电极之间的间距的单个多壁碳纳米管上使用两种不同的金属(铂和钨)沉积,我们隔离了纳米管固有特性的变化和金属沉积引起的总电导率提高中的接触改善的贡献。在这些实验中,使用在Raithl50中提供的气体注入系统将金属精确地沉积在试管上的所需位置上。两次直接写入装置通过3 KeV电子束诱导的沉积,使用有机金属前体三甲基-甲基环戊二烯-铂(用于Pt)和钨六羰基(用于W)。在MWNT上沉积Pt和W金属后,观察到电导率通常会增加140%至540%。电导率的变化用费米能级的状态密度的变化来解释,这是由于金属原子与纳米管之间的电荷转移以及在管子上产生的径向应力引起的。对沉积的金属管的HRTEM研究表明,金属原子在管的深壳内扩散,导致壳间相互作用增加,从而提高了电导率。

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