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2D Quantum Mechanical Device Modeling and Simulation: Single and Multi-fin FinFET

机译:二维量子机械设备建模与仿真:单鳍和多鳍FinFET

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A two-dimensional quantum mechanical modeling has been performed to simulate a nano-scaie FinFET by obtaining the self-consistent solution of coupled Poisson and Schroedinger equations. Calculated current-voltage (Ⅰ-Ⅴ) curves are carefully compared with experimental data to verify the validity of our theoretical work. The transconductance (G_(mmax)=380) is optimized through varying the Si-fin thickness (T_(fin)) from 10nm to 75nm. In order to ascertain the current drivability of FinFET, we investigated the dependence on the number of fins. The electron distributions for single and multiple fins FinFETs are reported with several gate voltage V_g=1.5V, -0.3V, 1.5V. In addition, calculated Ⅰ_d-Ⅴ_g curve of single fin FinFET is also compared with three and five fins FinFET. From these simulation results, the mechanism of the formation of channel and high current drivability of multiple fins FinFET can be understood.
机译:通过获得耦合的Poisson和Schroedinger方程的自洽解,已经进行了二维量子力学建模来模拟纳米鳞片FinFET。将计算出的电流-电压(Ⅰ-Ⅴ)曲线与实验数据进行仔细比较,以验证我们理论工作的有效性。通过将Si鳍厚度(T_(fin))从10nm更改为75nm,可以优化跨导(G_(mmax)= 380)。为了确定FinFET的当前可驱动性,我们研究了对鳍片数量的依赖性。报告了单个和多个鳍FinFET的电子分布,其栅极电压为V_g = 1.5V,-0.3V,1.5V。此外,还将单鳍FinFET的Ⅰ_d-Ⅴ_g曲线与三鳍和五鳍FinFET进行了比较。从这些仿真结果,可以理解多鳍片FinFET的沟道形成和高电流驱动性的机理。

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