TOPTICA Photonics AG, Lochhamer Schlag 19, 82166 Graefelfing, Germany;
TOPTICA Photonics AG, Lochhamer Schlag 19, 82166 Graefelfing, Germany;
TOPTICA Photonics AG, Lochhamer Schlag 19, 82166 Graefelfing, Germany;
TOPTICA Photonics AG, Lochhamer Schlag 19, 82166 Graefelfing, Germany;
TOPTICA Photonics AG, Lochhamer Schlag 19, 82166 Graefelfing, Germany;
Beijing Center for Crystal Growth and Development, Key Laboratory of Functional Crystals and Laser Technology, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing 100190, China;
Beijing Center for Crystal Growth and Development, Key Laboratory of Functional Crystals and Laser Technology, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing 100190, China;
Beijing Center for Crystal Growth and Development, Key Laboratory of Functional Crystals and Laser Technology, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing 100190, China;
Beijing Center for Crystal Growth and Development, Key Laboratory of Functional Crystals and Laser Technology, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing 100190, China;
KBBF; Deep-Ultraviolet; Narrow-Band; Diode Laser; Spectroscopy;
机译:可见光谱中的紧凑型二极管泵浦CW固态激光器可见光谱区中的紧凑型二极管泵浦CW固态激光器
机译:使用激光产生的等离子体在193 nm处的准点非相干ArF〜*准分子发射源
机译:基于固态Nd:YAG激光器,参量振荡器和ArF放大器的波长为193nm的皮秒激光系统
机译:微型20mW CW 280nm和266nm固态UV激光源的演示
机译:开发用于产生高功率193 nm准分子激光短脉冲的分布式反馈染料激光器。
机译:193 nm ArF受激准分子激光在激光辅助等离子体增强SiNx的化学气相沉积中的作用以进行低温薄膜封装
机译:使用193nm CW光源启用邻近掩模对齐器光刻
机译:193nm准分子激光曝光过程中单晶氧化锌的锌离子和中性发射。