Aberrations of Asymmetric Reflector Design

摘要

Asymmetric reflector aberrations worsen illuminance uniformity and distort illuminance pattern. Using trough reflector design as an example, the aberrations are found significant in the design where the β angle coverage is in low number zones. In that situation an alternative approach could be used to achieve the same if not better illuminance uniformity. Besides target position, optical planning is also found a factor influencing the actual illuminance distribution although its impact is limited. An intensity-based reflector design method with both normalizing factor and reflector reflectance incorporated as variables is applied to compare all the designs. A new calculation method using α angle to acquire (x, y) coordinates is used to generate the reflector profiles.