Paradigm Shifts in Semiconductor Industry Leading to Single-Wafer Processing ― Implementing 'SCROD' Clean in Production ―

摘要

A growing trend in networked digital consumer electronics has led to paradigm shifts in semiconductor manufacturing towards shorter cycle-time "mini-fab" operations, where single-wafer processing is preferable to traditional batch processing. We have developed a new single-wafer spin cleaning that alternately cycles between ozonated water and dilute HF for a few seconds at room temperature. Named "SCROD", this cleaning meets the requirements for stricter wafer cleanliness, larger diameter wafer processing, and greater respect for the environment. The motivations and challenges behind implementing SCROD in production are presented as a typical example of the new trend towards single-wafer processing.