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OPTICAL SPECTROSCOPY OF CARRIER RELAXATION AND TRANSPORT IN III/V SEMICONDUCTOR TUNNELING STRUCTURES

机译:III / V半导体隧道结构中载流子弛豫和传输的光学光谱

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Since the proposal and the demonstration of carrier tunneling in III/V semiconductor heterostructures, there has been a considerable and persistent interest in these phenomena. One motivation is the investigation of fundamental physical principles of quantum tunneling, and in a detailed description in the case of its realisations using semiconductor materials. This has direct relevance for the understanding and improvement of related systems, e.g., the intersubband infrared lasers also called quantum cascade lasers. On the other side there are perspectives for application of semiconductor tunneling structures in a variety of practical electronics devices including ultrahigh-speed devices oscillators, multi-valued logic switches, fast A/D converters and special purpose light-emitting diodes. The highly nonlinear I-V characteristics with eventual negative differential resistance (NDR) is an essential ingredient for most of the proposed applications. From the late eighties on, both steady-state and time-resolved photoluminescence were applied to investigate charge build-up near and inside a quantum well (QW) , the escape of electrons and holes from quantum wells, including partial results for unipolar devices under applied bias . In this paper, we will give an overview of the results we obtained since then by optical spectroscopy in different III/V tunneling structures. Some of the device-oriented aspects have already been discussed previously. Here, we will first consider unipolar double-barrier (DB) and triple-barrier (TB) resonant tunneling structures (RTS), in which tunneling times of minority-carrier have been determined. Then, bipolar devices are discussed with either a RTS or only a single barrier in the junction region, the so-called called RTLED (resonant tunneling LED), and TLED (tunneling LED) devices, respectively. Besides detailed understanding of carrier transport and electrical and optical phenomena, these investigations have also led to the design of electro-optic devices with ultrafast switching characteristics which are presently under further investigation.
机译:自从提出和论证III / V半导体异质结构中的载流子隧穿以来,人们对这些现象一直保持着相当大的兴趣。一种动机是研究量子隧穿的基本物理原理,并在使用半导体材料实现量子隧穿的情况下进行详细描述。这与相关系统的理解和改进直接相关,例如,子带间红外激光器也称为量子级联激光器。另一方面,半导体隧穿结构在各种实际电子设备中的应用前景也很广阔,包括超高速设备振荡器,多值逻辑开关,快速A / D转换器和专用发光​​二极管。高度非线性的I-V特性以及最终的负差分电阻(NDR)是大多数建议应用的基本要素。从八十年代后期开始,应用稳态和时间分辨光致发光技术研究量子阱(QW)附近和内部的电荷积聚,电子和空穴从量子阱中的逸出,包括单极性器件在光下的部分结果。应用偏见。在本文中,我们将概述自那时以来通过光谱在不同的III / V隧穿结构中获得的结果。先前已经讨论了一些面向设备的方面。在这里,我们将首先考虑单极双势垒(DB)和三势垒(TB)共振隧穿结构(RTS),其中已确定了少数载流子的隧穿时间。然后,将讨论在结区中仅具有RTS或仅具有单个势垒的双极器件,即所谓的RTLED(谐振隧道LED)和TLED(隧道LED)器件。除了详细了解载流子传输以及电学和光学现象外,这些研究还导致了具有超快开关特性的电光设备的设计,目前正在进一步研究中。

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