Key Laboratory of Advanced Display and System Applications, Ministry of Education, Shanghai University, Shanghai 200072, China TianMa Microelectronics Co., Ltd., Shenzhen 518118, China;
TianMa Microelectronics Co., Ltd., Shenzhen 518118, China;
Key Laboratory of Advanced Display and System Applications, Ministry of Education, Shanghai University, Shanghai 200072, China;
Key Laboratory of Advanced Display and System Applications, Ministry of Education, Shanghai University, Shanghai 200072, China;
Key Laboratory of Advanced Display and System Applications, Ministry of Education, Shanghai University, Shanghai 200072, China;
Shanghai Institute of Applied Mathematics and Mechanics, Shanghai University, Shanghai 200072, China;
zinc oxide films; O_2/Ar flux ratio; room temperature; RF magnetron sputtering; glass substrate;
机译:厚度,退火和衬底对RF溅射ZnO薄膜的结构,形态,光学和波导特性的影响
机译:衬底温度对直流磁控溅射Al和Ga共掺杂ZnO薄膜结构,形貌,电学和光学性质的影响
机译:在线射频磁控溅射在玻璃基板上织构的ZnO:Al膜的结构和光学性质
机译:氧对玻璃基材上溅射ZnO膜结构,形态学和光学性质的影响
机译:掺溅射玻璃膜的材料和光学性能研究。
机译:氧溅射压力对气敏性ZnO薄膜结构形貌和光学性质的影响
机译:RF磁控溅射在玻璃基板上生长的热处理GA掺杂ZnO薄膜的结构和光学性质