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Synthesis and Characterization of Monolayer Bimetallic Surfaces: A Synchrotron NEXAFS and XPS Study

机译:单层双金属表面的合成与表征:同步加速器NEXAFS和XPS研究

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Adsorbate near-edge x-ray absorption fine structure (NEXAFS) is a powerful spectroscopic technique that allows the direct measurement of electron orbital occupancies on model catalyst surfaces. Surface-limited redox replacement (SLRR), also called, when repeatedly performed for the fabrication of bulk layers, electrochemical atomic layer deposition (EC-ALD), is a promising technique for the fabrication of bimetallic surfaces for NEXAFS study (1). SLRR involves the electrodeposition of single sacrificial atomic monolayers and their replacement by a second element via redox galvanic replacement. The exchange reaction is limited by the amount of sacrificial material predeposited (Fig. 1). This technique has been explored as a method of large scale layer-by-layer growth of metals on flat and porous surfaces, as well as the fabrication of catalyst nanoparticles, primarily through the use of Cu or Pb sacrificial layers. (1-11)
机译:吸附物近边缘X射线吸收精细结构(NEXAFS)是一种强大的光谱技术,可直接测量模型催化剂表面上的电子轨道占有率。表面限制氧化还原置换(SLRR)也被称为电化学原子层沉积(EC-ALD),当重复进行本体层制造时,它是用于NEXAFS研究的双金属表面制造的一种有前途的技术(1)。 SLRR涉及单个牺牲原子单层的电沉积,并通过氧化还原原电池置换将其替换为第二种元素。交换反应受预先沉积的牺牲材料量的限制(图1)。已经探索了该技术,作为一种在平坦和多孔表面上大规模逐层生长金属的方法,以及主要通过使用Cu或Pb牺牲层来制造催化剂纳米颗粒的方法。 (1-11)

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