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New infrared luminescence band in silicon nanowires

机译:硅纳米线中新的红外发光带

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We studied infrared photoluminescence in wire-like silicon crystals grown by gold stimulated CVD technique. Such crystals present the smallest Si-based heterostructure consisting of bulk silicon and a cell-assembled silicon envelope. Cells have spheroid-like shape. Size of the cells equals 2-5 nm. A thickness their fact walls is equal to ~ 1 nm. A complex structure of the crystals gives rise to a complex photoluminescence spectra consisting of the know spectra of bulk silicon (band-exciton and LO- and TO-replicas) and intensive new band at 1,139 eV. The larger is a thickness of the envelope the more intensive new band. We studied a spectral shape of the new band and its intensity versus a power exciting and temperature. It was found that both they differ completely from the known spectra of bulk silicon and indicate on quantum origin of the envelope and on existence of superradiance.
机译:我们研究了金激发的CVD技术生长的线状硅晶体中的红外光致发光。这样的晶体呈现出最小的基于硅的异质结构,该结构由体硅和单元组装的硅外壳组成。细胞具有类球体的形状。单元的大小等于2-5 nm。其实际壁的厚度等于〜1 nm。晶体的复杂结构产生了复杂的光致发光光谱,该光谱由体硅的已知光谱(能带激,LO和TO副本)和在1139 eV处的高强度新能带组成。信封的厚度越大,新带的强度就越大。我们研究了新频段的频谱形状及其强度与功率激励和温度之间的关系。发现它们两者与块状硅的已知光谱完全不同,并且指示了包络的量子起源和超辐射度的存在。

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