Plasmonic structures fabricated via nanomasking sub-10 nm lithography technique

摘要

Making use of a newly established nanomasking technique, nanoscale features (sub-10 nm) have been fabricated with the potential to act as plasmonic enhancement structures. The technique makes use of a two-step lithography process to simultaneously produce many plasmonic hotspots with two-dimensional features over a large area, showing promise for mass production scalability. This technique is highly reproducible, reliably patterning multiple nanostructures and nanogaps over a potentially wafer-scale area without significantly increasing the number of steps required. Fabrication results show promise for scalability towards applications such as biosensing, photovoltaics, and enhanced spectroscopies.