Scalable nanostructuring on polymer by a SiC stamp: optical and wetting effects

摘要

A method for fabricating scalable antireflective nanostructures on polymer surfaces (polycarbonate) is demonstrated. The transition from small scale fabrication of nanostructures to a scalable replication technique can be quite challenging. In this work, an area per print corresponding to a 2-inch-wafer, is presented. The initial nanopatterning is performed on SiC in a 2-step process. Depending on the nanostructures the transmission of the SiC surface can be increased or suppressed (average height of nanostructures ～300nm and ～600nm, respectively) while the reflectance is decreased, when compared to a bare surface. The reflectance of SiC can be reduced down to 0.5% when the ～600nm nanostructures are applied on the surface (bare surface reflectance 25%). The texture of the green SiC color is changed when the different nanostructures are apparent. The ～600nm SiC nanostructures are replicated on polymer through a process flow that involved hot embossing and galvanization. The resulted polymer structures have similar average height and exhibit more rounded edges than the initial SiC nanostructures. The polymer surface becomes antireflective and hydrophobic after nanostructuring. The contact angle changes from 68 (bare) to 123 (nanostructured) degrees. The optical effect on the polymer surface can be maximized by applying a thin aluminum (Al) layer coating on the nanostructures (bare polymer reflectance 11%, nanostructured polymer reflectance 5%, Al coated nanostructured polymer reflectance 3%). The optical measurements were performed with an integrating sphere and a spectrometer. The contact angles were measured with a drop shape analyzer. The nanostructures were characterized with scanning electron microscopy.