首页> 外国专利> NOVEL METHODS WITH ADVANCED OPTICAL EFFECTS FOR THE PRODUCTION OF PHOTO-SENSITIVE POLYMERIC NANOSTRUCTURES APPLICATIONS TO NANOPHOTOLITHOGRAPHY AND STORAGE OF VERY HIGH DENSITY INFORMATION

NOVEL METHODS WITH ADVANCED OPTICAL EFFECTS FOR THE PRODUCTION OF PHOTO-SENSITIVE POLYMERIC NANOSTRUCTURES APPLICATIONS TO NANOPHOTOLITHOGRAPHY AND STORAGE OF VERY HIGH DENSITY INFORMATION

机译:具有先进光学效应的新型光敏聚合物纳米结构的生产方法在纳米光照相术和存储非常高密度信息中的应用

摘要

The invention concerns production of nanostructures on polymers for applications in nanophotolithography and high-density data storage. The corresponding nanoobjects are obtained through improved tip optical effects, the tips acting as so-called opening-free nanosources. The novel techniques of local photopolymerisation are also used to photoinduce in specific polymers non-linear, photoluminescent and locally conductive or insulating properties. The applications in nanophotolithography also concerns integrated electro-optical functions, source matrices, and more generally a wide variety of substrates for use in nanoelectronics.
机译:本发明涉及用于聚合物的纳米结构的生产,以用于纳米光刻和高密度数据存储。通过改进的尖端光学效果获得相应的纳米物体,这些尖端充当所谓的无开口纳米源。局部光聚合的新技术还用于在特定聚合物中光诱导非线性,光致发光以及局部导电或绝缘性能。纳米光刻中的应用还涉及集成的电光功能,源矩阵,以及更广泛地用于纳米电子学的各种基材。

著录项

  • 公开/公告号FR2832994A1

    专利类型

  • 公开/公告日2003-06-06

    原文格式PDF

  • 申请/专利权人 BACHELOT RENAUD;ROYER PASCAL;

    申请/专利号FR20010015482

  • 发明设计人 BACHELOT RENAUD;ROYER PASCAL;

    申请日2001-11-30

  • 分类号B82B3/00;B82B1/00;G12B21/06;

  • 国家 FR

  • 入库时间 2022-08-21 23:37:48

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