Influence of adjustment accuracy on the image quality for laser cluster systems of microlithography

摘要

Abstract: Aberration research in the optic system was conducted by finding possible angles between the axis of the illuminator and a lens on the basis of the analysis of intensity on the image plane. Intensity distribution was drawn after calculation of aberration deformations of the wave front. Quality of the image of three lines with crosscut size of 0.5, 1.0 and 3.0 $mu@m on the margin of 5 $MUL 5 mm field was investigated with the worse variant taken into account.!6