Software integration of in-situ spectroscopic ellipsometry

摘要

Abstract: In situ sensors are key tools for flexible manufacturing environments where wafers with diverse specifications are processed interspersed through common chambers. This is in contrast to conventional batch processing where pilot wafers, ex situ measurement, and statistical method are employed for process control. In the present work, we discuss integration of in situ spectral ellipsometry (SE) into several processes of a flexible manufacturing environment. In situ SE enables real-time wafer-to-wafer compensation for equipment and process drifts and also equipment prognosis. The capability of the TI SE is discussed together with the implementation issues of solving the inverse problem in real time. A robust endpoint detection algorithm using TI SE is presented. Also addressed are the issues in the integration of the SE with the machine control as well as with the computer integrated manufacturing factory for feedforward and feedback control.!19