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Emissivity compensated radiance-contrast-tracking pyrometry for semiconductor processing

机译:用于半导体加工的发射率补偿的辐射度对比跟踪高温法

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Abstract: In this paper an analysis technique is presented which allows the achievable performance specifications for a single wavelength pyrometer to be calculated. The effects of pyrometer wavelength, wafer emissivity, background radiation and detector noise limitations are all taken into account in the modelling. It is demonstrated that in order to maintain a given precision the wavelength of the pyrometer must be progressively reduced in order to maintain radiance contrast as the wafer temperature rises. The analysis technique is also shown to be an effective design tool for determining the required electronic and optical performance specifications of the pyrometer in order to obtain a given temperature measurement precision.!3
机译:摘要:本文提出了一种分析技术,该技术可以计算出单波长高温计可达到的性能指标。建模中考虑了高温计波长,晶片发射率,背景辐射和检测器噪声限制的影响。已经证明,为了保持给定的精度,高温计的波长必须逐渐减小,以便在晶片温度升高时保持辐射对比度。分析技术还被证明是一种有效的设计工具,用于确定高温计所需的电子和光学性能规格,从而获得给定的温度测量精度!3

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