Customized micro mirror array for highly parallel industrial laser direct processing on the micro- and nanoscale

摘要

Fraunhofer IPMS has developed a linear micro mirror array (ASLM8k) for use as fast intensity modulator in the DUVUV spectral range (190-410nm). Its 2.2 Million mirrors are grouped to 8192 pixels. Framerates of about 1MHz enable parallel high speed exposure at rates of >10.10⁹ Pixel/s (greyscale). Large pixels serve to provide a comparably high laser energy in the partial beams while keeping the fluence at the MMA below damage threshold. The ASLM8k is a perfect match for powerful high repetition rate lasers and allows to address applications like laser direct imaging (LDI), i.e. maskless exposure of photoresists, and laser direct writing (LDW), e.g. laser patterning of thin films. The ASLM8k has been successfully used in prototypes of a LDI tool developed by an industrial partner. Fraunhofer IPMS aims to contiue the development of the ASLM8k with further industrial partners to utilize the MMA for additional applications.