首页> 外文会议>Micro/Nanoscale Heat Transfer International Conference 2008 >FABRICATION OF SILICON MICROCHANNEL WITH INTEGRATED HEATER AND TEMPERATURE SENSORS FOR FLOW BOILING STUDIES
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FABRICATION OF SILICON MICROCHANNEL WITH INTEGRATED HEATER AND TEMPERATURE SENSORS FOR FLOW BOILING STUDIES

机译:集成加热器和温度传感器的硅微通道的沸腾研究。

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Two-phase microchannel heat sinks are a promising solution to meet the requirements for cooling electronic components with high-density heat dissipation. However, their design requires a thorough understanding of flow boiling and pressure drop in microchannels. The channels described in this paper have been fabricated in silicon, with rectangular cross-sections ranging in hydraulic diameter between 0.62 and 0.1 mm, for studies of boiling in single channels. To facilitate visualisation, the top of each channel is covered with Pyrex 7740, predrilled for fluid inlet and outlet connections. Integrated tantalum resistors are located uniformly along the bottom of the channel for temperature sensing. Tantalum pentoxide and PECVD silicon dioxide (which also conformally coats the channel walls) are used to electrically insulate the sensor from any liquid in the channel. The heater is an integrated aluminium serpentine track on the back of the bottom wafer. The channel is etched down to the sensors on the bonded bottom silicon wafer using the Bosch process. The objective related to the development of these silicon microchannels is to achieve heat fluxes of 2 MW m~(-2) with low, near-uniform wall superheat (by means of bubble triggering and artificial nucleation sites). Experiments will be carried out with mass fluxes varying from 100 to 500 kg m~(-2) s~(-1), using de-ionized water and an organic fluid as the working fluids.
机译:两相微通道散热器是一种有前途的解决方案,可以满足冷却具有高密度散热的电子组件的要求。但是,它们的设计需要对微通道中的沸腾和压降有透彻的了解。本文研究的通道是用硅制成的,其矩形横截面的水力直径范围为0.62至0.1 mm,用于研究单通道的沸腾。为了便于可视化,每个通道的顶部都覆盖有Pyrex 7740,并预先钻孔以用于流体入口和出口连接。集成钽电阻沿通道底部均匀放置,以进行温度检测。五氧化二钽和PECVD二氧化硅(也共形地覆盖通道壁)用于使传感器与通道中的任何液体绝缘。加热器是位于底部晶圆背面的集成铝制蛇形导轨。使用博世(Bosch)工艺将沟道蚀刻至键合底部硅晶片上的传感器。与这些硅微通道的开发有关的目的是通过低的,几乎均匀的壁过热(通过气泡触发和人工成核位点)获得2 MW m〜(-2)的热通量。将使用去离子水和有机流体作为工作流体,以100至500 kg m〜(-2)s〜(-1)的质量通量进行实验。

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