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ROUND-ROBIN TESTS OF MODULUS AND STRENGTH OF POLYSILICON

机译:多晶硅模量和强度的轮循试验

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The Young's modulus and strength of polysilicon specimens manufactured in the same production run were measured in four different laboratories. Specimens subjected to in-plane bending were tested at U. C. Berkeley and at Failure Analysis Associates, and tensile measurements were made at Caltech and Johns Hopkins. All specimens were produced at the Microelectronics Center of North Carolina (MCNC).rnIn bending, the Young's modulus for specimens nominally 2 μm thick was measured as 174 GPa and 137 GPa; whereas in tension, a value of 132 GPa was obtained. Modulus values of 136 GPa and 142 GPa were measured in tension on specimens nominally 1.5 μm and 3.5 μm thick. Strengths of the brittle polysilicon were 2.8 and 2.7 GPa in bending and 1.3 GPa for both thicknesses in tension.rnThese preliminary results were presented at Symposium N - Microelectromechanical Structures for Materials Research at the Materials Research Society meeting in April 1998. This paper is a short overview of the test methods - each of which is described elsewhere - and a documentation of the results presented at that time.
机译:在四个不同的实验室中,对在同一生产过程中生产的多晶硅样品的杨氏模量和强度进行了测量。在U.C. Berkeley和Failure Analysis Associates进行了经受平面弯曲的试样,并在Caltech和Johns Hopkins进行了拉伸测量。所有样品均在北卡罗来纳州微电子中心(MCNC)生产。弯曲时,标称厚度为2μm的样品的杨氏模量分别为174 GPa和137 GPa。而在张力下,获得的值为132 GPa。在标称厚度为1.5μm和3.5μm的样品上测量了136 GPa和142 GPa的模量值。脆性多晶硅的弯曲强度分别为2.8 GPa和2.7 GPa,两种厚度上的拉伸强度均为1.3 GPa。这些初步结果在1998年4月材料研究学会会议上举行的N研讨会-材料研究用微机电结构上发表。测试方法概述(每种方法均在其他地方进行了说明)以及当时提供的结果文档。

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