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Novel layered two-dimensional semiconductors as the building blocks for nano-electronic/photonic systems

机译:新型分层二维半导体作为纳米电子/光子系统的基础

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Layered two-dimensional (2D) semiconductors beyond graphene have been emerging as potential building blocks for the next-generation electronic/photonic applications. Representative metal chalcogenides, including the widely studied MoS_2, possess similar layered crystal structures with weak interaction between adjacent layers, thus allowing the formation of stable thin-layer crystals with thickness down to a few or even single atomic layer. Other important chalcogenides, involving earth-abundant and environment-friendly materials desirable for sustainable applications, include SnS_2 (band gap: 2.1 eV) and SnS (band gap: 1.1 eV). So far, commonly adopted for research purpose are mechanical and liquid exfoliation methods for creating thin layers of such 2D semiconductors. Most recently, chemical vapor deposition (CVD) was attracting significant attention as a practical method for producing thin films or crystal grains of MoS_2. However, critical yet still absent is an effective experimental approach for controlling the positions of thin crystal grains of layered 2D semiconductors during the CVD process. Here we report the controlled CVD synthesis of thin crystal arrays of representative layered semiconductors (including SnS_2 and SnS) at designed locations on chip, promising large-scale optoelectronic applications. Our work opens a window for future practical applications of layered 2D semiconductors in integrated nano-electronic/photonic systems.
机译:石墨烯以外的分层二维(2D)半导体已成为下一代电子/光子应用的潜在组成部分。包括广泛研究的MoS_2在内的代表性金属硫属化物具有相似的层状晶体结构,相邻层之间的相互作用较弱,因此可以形成厚度低至几个甚至单个原子层的稳定的薄层晶体。其他重要的硫族化物涉及可持续发展所需的地球富裕和环境友好的材料,包括SnS_2(带隙:2.1 eV)和SnS(带隙:1.1 eV)。到目前为止,通常用于研究目的的是用于产生这种2D半导体薄层的机械和液体剥离方法。最近,化学气相沉积(CVD)作为生产MoS_2的薄膜或晶粒的实用方法引起了广泛的关注。然而,关键的但仍然缺乏的是一种有效的实验方法,用于在CVD工艺中控制分层2D半导体的细晶粒的位置。在这里,我们报告了在芯片的设计位置上,具有代表性的分层半导体(包括SnS_2和SnS)的有代表性的半导体的薄晶体阵列的受控CVD合成,有望实现大规模的光电应用。我们的工作为集成纳米电子/光子系统中分层2D半导体的未来实际应用打开了一个窗口。

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